Intel has championed High-NA EUV chipmaking tools, but costs and other limitations could delay industry-wide adoption: Report

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Posted Wednesday at 04:36 PM5 days

Intel has taken an early lead in High-NA EUV lithography, but widespread adoption remains constrained by high tool costs, limited exposure field size, and potential need for substantial ecosystem upgrades.

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2 days2 days James changed the title to Intel has championed High-NA EUV chipmaking tools, but costs and other limitations could delay industry-wide adoption: Report